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ST0021 Indium (In) Sputtering Target

Catalog No. ST0021
Composition In
CAS Number 7440-74-6
Purity ≥99%
Shape Discs, or Custom-made
Diameter 2", 3", 4", 5", 6", or customized
Thickness 0.25", 0.125", or customized
Bond Type Copper, or customized

Indium (In) Sputtering Target is engineered to deliver exceptional performance and consistency in thin film deposition. Stanford Advanced Materials is committed to innovation, quality, and customer satisfaction, making it a trusted supplier for high-performance materials in advanced industrial applications.

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Indium (In) Sputtering Target
Indium (In) Sputtering Target
Description
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Indium (In) Sputtering Target Description

Indium (In) Sputtering Target is a premium material developed for use in sputtering systems, offering excellent purity and outstanding deposition characteristics. Manufactured with stringent quality controls, this target is optimized for DC sputtering, ensuring smooth, even thin films for critical applications in the semiconductor, display, and solar industries. Its consistent composition and customizable shapes provide versatility and precision for specialized industrial requirements.

Indium (In) Sputtering Target Applications

· Microelectronics: Utilized for depositing thin films in semiconductor devices where precision and high-quality coatings are required.
· Optoelectronics: Ideal for fabricating display elements and photovoltaic cells with uniform film properties.
· Solar Cells: Enhances the performance of photovoltaic modules by providing superior thin film layers.
· Research & Development: Employed in experimental setups to develop next-generation electronic materials and devices.

Indium (In) Sputtering Target Packing

Our Indium (In) Sputtering Targets are meticulously packaged to maintain their integrity during transportation and storage.
Vacuum-sealed packaging: Typically available in 1kg pouches or as per custom order specifications to meet your specific process requirements.

Frequently Asked Questions

Q: What industries benefit most from using indium sputtering targets?
A: Industries such as microelectronics, optoelectronics, and photovoltaics greatly benefit from using indium sputtering targets due to their excellent thin film deposition properties.

Q: How does the purity of the indium target affect its performance?
A: High purity (≥99%) ensures consistent thin film quality, minimizes contamination, and is critical for achieving reliable and reproducible results in sensitive applications.

Q: Can the shape and size of the Indium sputtering target be customized?
A: Yes, in addition to standard discs, custom-made shapes and sizes are available to match specific equipment requirements.

Q: What sputtering method is recommended for this target material?
A: The target is optimized for DC sputtering, which ensures efficient and uniform material deposition.

Q: How should I store the indium sputtering targets to maintain their quality?
A: It is recommended to store the targets in a cool, dry environment, ideally in their original vacuum-sealed packaging, to prevent oxidation and contamination.

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Send us an inquiry today to learn more and receive the latest pricing. Thank you!

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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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